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Normas DIN – AENOR
DIN 50455-1:2008-04

DIN 50455-1:2008-04

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods / Note: Date of issue 2008-04-07

Essai des matériaux pour la technologie des semiconducteurs - Méthodes de caractérisation des vernis pour photos - Partie 2: Détermination de l'épaisseur des couches par méthode optique / Attention: Date de parution 2008-04-07

Prüfung von Materialien für die Halbleitertechnologie - Verfahren zur Charakterisierung von Fotolacken - Teil 1: Bestimmung der Schichtdicke mit optischen Messverfahren / Achtung: Erscheinungsdatum 2008-04-07

Fecha Anulación:
2019-10 /Withdrawn
Relación con otras normas DIN:

Reemplazada por: DIN 50455-1:2009-10

Resumen:
This document specifies methods for characterizing photoresists by determining of coating thickness of photoresists prepared under conditions specified in this document. The coating procedure is applicable to silicon slices with diameters of 100 mm to 200 mm. Use on other substrates or slice diameters is possible in principle if each case was tested.
Keywords:
Chemicals, Coating thickness, Cover coats, Electronic engineering, Inspection, Materials, Materials testing, Measurement, Measuring techniques, Optical measurement, Photoresists, Properties, Semiconductor technology, Silicon slices, Testing, Thickness, Varnishes
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