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Normas ASTM – AENOR
ASTM E2444-11e1

ASTM E2444-11e1

Terminology Relating to Measurements Taken on Thin, Reflecting Films

Fecha:
2018-05-28 /Historical
Superseeded by:
Scope:

1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section 2, which were generated by Committee E08 on Fatigue and Fracture. Terminology E1823 Relating to Fatigue and Fracture Testing is applicable to this standard.

1.2 The terms are listed in alphabetical order.

Keywords:
cantilevers; definitions; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; stiction; strain gradient; terminology; test structure
44,44
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